Science of entropy-stabilized ultra-high temperature thin films: Synthesis, validation and properties
September 17-20, 2017
The authors report on using multi-cathode magnetron sputtering to fabricate 5-component refractory carbides that are stabilized by configurational entropy to form a robust and high-temperature class of high temperature materials. Magnetron sputtering is an appealing fabrication method as one can prepare layers with high density and the compositional flexibility afforded by five independent metallic sources. Thin layers that comprise mixed carbides of the following elements: W, Mo, Ti, Hf, Zr, Ta, V, and Nb, will be discussed. In all cases sputtering is performed reactively in a gas atmosphere including Ar as the inert sputter gas and propane as the carbon source. Sputter depositions can be conducted between room temperature and 800 °C. The relationship between sputtering parameters including power, pressure, rate, gas mixture, and film properties including density, thermal conductivity, lattice constant, and phase evolution will be discussed.
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Jon-Paul Maria, Trent Borman, Donald Brenner, Elizabeth Oplia, Tina Rost, Patrick Hopkins, Ken Vecchio, Tyler Harrington, Cormac Toher, and Stefano Curtarolo, "Science of entropy-stabilized ultra-high temperature thin films: Synthesis, validation and properties" in "Ultra-High Temperature Ceramics: Materials for Extreme Environment Applications IV", Jon Binner, The University of Birmingham, Edgbaston, United Kingdom Bill Lee, Imperial College, London, United Kingdom Eds, ECI Symposium Series, (2017). http://dc.engconfintl.org/uhtc_iv/28
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