High-resolution strain-mapping during in-situ nanoindentation of CVD thin films
September 29-October 4, 2019
The NanoMAX beamline is a hard X-ray nanoprobe beamline at MAX IV Laboratory, Lund, Sweden. This beamline was designed to take full advantage of the exceptionally low emittance and the resulting coherence properties of the X-ray beam. A nano-focus beam of 50×50 nm2 of high X-ray photon intensity is available for experiments. This small focus is ideal to investigate heterogeneous samples in materials science with high spatial resolution, utilizing techniques such as scanning X-ray diffraction, 2D X-ray fluorescence mapping, and coherent imaging in the Bragg geometry.
Chalmers University of Technology and MAX IV Laboratory have acquired a nanoindenter to be installed at the NanoMAX beamline. The combination of in-situ micro-mechanical testing and nano-focused scanning X-ray diffraction permits time-resolved high-resolution in-situ strain mapping. The experimental configuration is based on an Alemnis nanoindenter which is transferrable between the beamline and a scanning electron microscope (SEM). This allows for a sample characterization in a SEM prior to the X-ray beamline experiment. A potential science case is the investigation of local residual stress fields and their changes under increasing load.
Please click Additional Files below to see the full abstract.
Gudrun Lotze, Olof Bäcke, Sebastian Kalbfleisch, Stefan Carlson, and Magnus Hörnqvist Colliander, "High-resolution strain-mapping during in-situ nanoindentation of CVD thin films" in "Nanomechanical Testing in Materials Research and Development VII", Jon Molina-Aldareguia, IMDEA-Materials Institute, Spain Eds, ECI Symposium Series, (2019). https://dc.engconfintl.org/nanochemtest_vii/93