Tailoring thin-film mechanical fragmentation properties of hybrid atomic/molecular-layer-deposited materials

Conference Dates

October 2 – 7, 2022


Molecular layer deposition (MLD) as the "little sister" of atomic layer deposition is a strongly emerging thin-film technique for deposition of ultra-thin inorganic–organic hybrid (“metalcone”) coatings directly from the gas phase, even on complex three-dimensional surfaces. Employing tensile testing coupled with in situ optical microscopy, we found [1] that using inorganic metal oxide ALD alone could increase the crack onset strain via nanolaminating amorphous and nanocrystalline film layers, see fig. 1a. This behavior can be attributed to changing residual strains [2] in the overall Al2O3/Y2O3 nanolaminate film and shifted the crack onset strain from 0.67% to 1.1% (and decreased the crack density by a factor 2). However, introducing organic carbon backbones into the inorganic oxide material allows increasing the crack onset strain by an order of magnitude.

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