Science of entropy-stabilized ultra-high temperature thin films: Synthesis, validation and properties

Conference Dates

September 17-20, 2017


The authors report on using multi-cathode magnetron sputtering to fabricate 5-component refractory carbides that are stabilized by configurational entropy to form a robust and high-temperature class of high temperature materials. Magnetron sputtering is an appealing fabrication method as one can prepare layers with high density and the compositional flexibility afforded by five independent metallic sources. Thin layers that comprise mixed carbides of the following elements: W, Mo, Ti, Hf, Zr, Ta, V, and Nb, will be discussed. In all cases sputtering is performed reactively in a gas atmosphere including Ar as the inert sputter gas and propane as the carbon source. Sputter depositions can be conducted between room temperature and 800 °C. The relationship between sputtering parameters including power, pressure, rate, gas mixture, and film properties including density, thermal conductivity, lattice constant, and phase evolution will be discussed.

Please click Additional Files below to see the full abstract.

This document is currently not available here.