Science of high entropy ultra-high temperature thin films: synthesis and characterization

Conference Dates

September 17-20, 2017


The authors describe the use of a 5-cathode reactive RF magnetron sputtering system to fabricate up to 5-component refractory high entropy carbides which form a robust class of high temperature materials. Magnetron sputtering is an appealing fabrication method it allows for deposition of high density films of many compositions at relatively low temperatures compared to bulk processing techniques. Thin films of mixed carbides consisting of the following elements: Ti, Zr, Hf, Nb, Ta, Mo, and W, will be discussed. All films are sputtered reactively in a gas atmosphere where Ar is the inert sputter gas with methane as the carbon source. Carbon stoichiometry is controlled via methane flow rates and assessed with density measurements. Use of 5 cathodes allows for rapid exploration of the 5 metal composition space from unary to quaternary or quinary carbides in short time spans.

Please click Additional Files below to see the full abstract.

This document is currently not available here.