In situ electrical resistance in metallic films under cyclic loading reveals mechanical damage mechanisms

Authors

• Megan J. Cordill, Erich Schmid Institute of Materials Science, Austrian Academy of Sciences Leoben, AustriaFollow
• Anna Krapf, Dept Materials Science & Engineering, Institute 1, Friedrich-Alexander-University, Germany
• David Gebhart, Erich Schmid Institute of Materials Science, Austrian Academy of Sciences, Austria
• Benoit Merle, nstitute of Materials Engineering, University of Kassel, Moechenbergerstr, Germany
• Christoph Gammer, Erich Schmid Institute of Materials Science, Austrian Academy of Sciences, Austria

Conference Dates

October 6-11, 2024

Abstract

Please click Additional Files below to see the full abstract.

Recommended Citation

Megan J. Cordill, Anna Krapf, David Gebhart, Benoit Merle, and Christoph Gammer, "In situ electrical resistance in metallic films under cyclic loading reveals mechanical damage mechanisms" in "Nanomechanical Testing in Materials Research and Development IX", Marco Sebastiani, Universita degli studi Roma Tre, Italy Eds, ECI Symposium Series, (2024). https://dc.engconfintl.org/nanomechtest_ix/108