Clean dry etching of Cu and Ni alloy metal thin film by reactive proton assisted etching

Authors

MunPyo Hong, Korea University, KoreaFollow
Sungyoun Lee, Korea University, Korea
Minyoung Kim, Korea University, Korea
Sangheon Lee, Korea University, Korea
Donghoon Kim, Korea University, Korea
Chiwoo Kim, APS Research Corporation, Korea
Jin Nyoung Jang, APS Research Corporation, Korea
Jong Hwa Lee, APS Research Corporation, Korea
Sang-Gab Kim, Samsung Display, Korea

Conference Dates

May 15-18, 2023

Abstract

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Recommended Citation

MunPyo Hong, Sungyoun Lee, Minyoung Kim, Sangheon Lee, Donghoon Kim, Chiwoo Kim, Jin Nyoung Jang, Jong Hwa Lee, and Sang-Gab Kim, "Clean dry etching of Cu and Ni alloy metal thin film by reactive proton assisted etching" in "Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors (ULSIC VS TFT 8)", Y. Kuo, Texas A&M University, USA Eds, ECI Symposium Series, (2022). https://dc.engconfintl.org/ulsic_vs_tft_8/7